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Luminescence properties of MOCVD grown Al <inf>0.2</inf> Ga <inf>0.8</inf> N layers implanted with Tb

dc.contributor.authorRodrigues, J.en_US
dc.contributor.authorFialho, M.en_US
dc.contributor.authorMagalhães, S.en_US
dc.contributor.authorLorenz, K.en_US
dc.contributor.authorAlves, E.en_US
dc.contributor.authorMonteiro, T.en_US
dc.date.accessioned2021-07-27T17:57:43Z
dc.date.available2021-07-27T17:57:43Z
dc.date.issued2019en_US
dc.date.updated2021-07-27T17:57:43Z
dc.description.versionN/A
dc.identifier.doi10.1016/j.jlumin.2019.02.060en_US
dc.identifier.eid2-s2.0-85062464585en_US
dc.identifier.slugcv-prod-695450
dc.identifier.urihttp://hdl.handle.net/10451/49179
dc.language.isoN/Apor
dc.relationNAno-engineering of wide bandgap Semiconductors using Ion Beams
dc.titleLuminescence properties of MOCVD grown Al <inf>0.2</inf> Ga <inf>0.8</inf> N layers implanted with Tben_US
dc.typejournal article
dspace.entity.typePublication
oaire.awardTitleNAno-engineering of wide bandgap Semiconductors using Ion Beams
oaire.awardURIinfo:eu-repo/grantAgreement/FCT/9471 - RIDTI/PTDC%2FCTM-CTM%2F28011%2F2017/PT
oaire.citation.endPage424
oaire.citation.startPage413
oaire.citation.titleJournal of Luminescenceen_US
oaire.citation.volume210en_US
oaire.fundingStream9471 - RIDTI
project.funder.identifierhttp://doi.org/10.13039/501100001871
project.funder.nameFundação para a Ciência e a Tecnologia
rcaap.cv.cienciaidE910-E432-2AB6 | Katharina Lorenz
rcaap.rightsopenAccessen_US
rcaap.typearticleen_US
relation.isProjectOfPublicationeebbb165-cfb3-4ae2-8d91-5a812141b1cc
relation.isProjectOfPublication.latestForDiscoveryeebbb165-cfb3-4ae2-8d91-5a812141b1cc

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